Nano polishing solution for gallium arsenide

Nano polishing solution:
It is mainly composed of colloidal silica particles with high purity, which can avoid scratching of processing components
It is especially suitable for polishing lithium niobate, lithium tantalate, sapphire, quartz, optical crystal, infrared crystal, metal, ceramic, silicon wafer, germanium, gallium arsenide, indium phosphide, silicon carbide, gallium nitride, etc

model	average particle size (nm)	SiO2 content (%)	pH
				50	40 0	39-41	10-11
80	72 0	39-41	10-11
100	100	39-41	10-11
120	80-120	39-41	10-11

removal rate: 5-7um / hour packaging specification: 20kg / barrel , Storage temperature: 25sp ℃ / barrel: 15 ℃, & Avoid sunlight; Shelf life: the shelf life of weak alkaline polishing solution is one year

Application fields of nano polishing fluid: 1 Metal materials, such as stainless steel, aluminum parts, zinc alloy 2 LED, sapphire substrate, watch lens, crystal, gem 3 Optical lens, optical glass, quartz 4 Magnetic head, hard disk 5 Optical fiber and photovoltaic ceramic enterprises 6 Semiconductor, silicon wafer, germanium, gallium arsenide, indium phosphide, silicon carbide, gallium nitride and other semiconductor materials