Al2O3 target magnetron sputtering target

Special for manufacturer direct selling scientific research experiment   Al2O3 magnetron sputtering target
Purity 99
99%
Product introduction
  Chemical formula: Al2O3
It is a high hardness compound with a melting point of 2054 ℃ and a boiling point of 2980 ℃
It is an ionic crystal that can be ionized at high temperature
It is commonly used in the manufacture of refractory materials
Alumina contains elements aluminum and oxygen
If the bauxite raw material is chemically treated to remove the oxides of silicon, iron and titanium, the product is alumina raw material with high purity, and the content of Al2O3 is generally more than 99%
The ore facies is composed of 40% ~ 76% gamma- Al2O3 and 24% ~ 60% of & alpha- Al2O3 composition& gamma;- Al2O3 can be transformed into & alpha at 950 ~ 1200 ℃- Al2O3, with significant volume shrinkage

The products are used as abrasives and for making crucibles, ceramics, refractories and artificial gemstones
It can be used as raw material for making aluminum and can form aluminum hydroxide with different crystal forms
Product parameters
Chinese name alumina , Boiling , Point 2980 & ordm; C molecular weight 101
96 , Secret , Degree 3
5-3
9g/cm3 appearance white amorphous powder , Ionic crystals that can ionize at high temperature are often used to make refractories
Product specifications Picture target, rectangular target, cylindrical target, step piece target, tube target, customized product use according to the customer's drawings, magnetron sputtering coating materials and other product accessories, formal quotation / purchase and sales contract / packing list / material analysis and testing list / formal * product packaging, vacuum packaging / vacuum neutral packaging / special packaging, external reinforcement packaging, applicable to various types of magnetron sputtering equipment Manufacturer advantages , Manufacturer direct selling , Return and replacement can be negotiated within 7 days after receipt   A complete range of targets
High purity sputtering target (specification customized as required)
High purity metal sputtering target Aluminum target Al, chromium target Cr, copper target Cu, iron target Fe, zinc target Zn, tin target Sn, magnesium target mg, cobalt target Co, nickel target Ni, titanium target Ti, gold target Au, silver target AG, platinum target Pt, rhenium target re, ruthenium target Ru, palladium target PD, rhodium target RH, iridium target IR, indium target in, vanadium target V, cadmium target CD, tungsten target W, molybdenum target Mo, tantalum target TA, niobium target Nb, zirconium target Zr, hafnium target HF, germanium target Ge, silicon target Si, manganese target Mn, bismuth target Bi, selenium target se, boron target B, calcium target Ca Alloy sputtering target (specification customized as required) Ti Ti Ti Ti Ti Al Al, Al Si Al Si, Al al al Al Si, Al Cu al Al Cu, Al Ti Al Ti, Al Ti Ti Ti, Ag Cu Cu Cu, Ag Ag Cu Cu Cu Cu, Al Mg Al Mg, Al Mg mg mg, co-fe-b-b-b-b-b-b-b-b-b-b-b-b-b-b-b-si-si, Al Si Al al al Si, Al Si Al Si, Al Si Al Si Si Si, Al Si Si Si Si Si Si, Al Si Si Si Si Si Si, Al al Al Si Si Si, al-v-v-v-v-v-v-v-v-v-v-v-v-v-v-b-b-b-ti-b-b-b-b-ti-b-b-b-b-b-b-b-ti-b-b-b-b-b-v-v-v-v-v-v-v-v-v-v-v-v-v-v-v-fe Ceramic target (specification customized as required) ITO target, azo target, igzo target, magnesium oxide target MgO, yttrium oxide target Y2O3, iron oxide target Fe2O3, nickel oxide target Ni2O3, chromium oxide target Cr2O3, zinc oxide target ZnO, zinc sulfide target ZnS, cadmium sulfide target CDs, molybdenum sulfide target MoS2, silicon dioxide target SiO2, silicon oxide target SiO, zirconia target ZrO2, niobium pentoxide target Nb2O5, titanium dioxide target TiO2, hafnium dioxide target HfO2 Titanium diboride target TiB2, zirconium diboride target ZrB2, tungsten trioxide target WO3, aluminum oxide target Al2O3, tantalum pentoxide target Ta2O5, magnesium fluoride target MgF2, zinc selenide target ZnSe, aluminum nitride target AlN, silicon nitride target Si3N4, boron nitride target BN, titanium nitride target tin, silicon carbide target SiC, lithium niobate target LiNbO3, praseodymium titanate target prtio3, barium titanate target BaTiO3, lanthanum titanate target lato3 Strontium titanate target SrTiO3 and other high density ceramic sputtering targets Rare earth target Gadolinium target Gd, samarium target SM, tellurium target te, dysprosium target Dy, cerium target CE, yttrium target y, lanthanum target La, antimony target sb, ytterbium target Yb, erbium target Er, terbium target TB, holmium target Ho, thulium target TM, neodymium target nd, praseodymium target PR, lutetium target Lu
Rare earth ceramic target Lanthanum oxide target La2O3, cerium oxide target CeO2, praseodymium oxide target Pr6O11, neodymium oxide Nd2O3, samarium oxide target Sm2O3, neodymium oxide target Nd2O3, erbium oxide Er2O3 target, thulium oxide target Tm2O3, holmium oxide target Ho2O3, europium oxide target Eu2O3 and other rare earth ceramic targets